Semiconductor device including n-type and p-type FinFET's...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S903000

Reexamination Certificate

active

07994583

ABSTRACT:
A semiconductor device according to an aspect of the invention comprises an n-type FinFET which is provided on a semiconductor substrate and which includes a first fin, a first gate electrode crossing a channel region of the first fin via a gate insulating film in three dimensions, and contact regions provided at both end of the first fin, a p-type FinFET which is provided on the semiconductor substrate and which includes a second fin, a second gate electrode crossing a channel region of the second fin via a gate insulating film in three dimensions, and contact regions provided at both end of the second fin, wherein the n- and the p-type FinFET constitute an inverter circuit, and the fin width of the contact region of the p-type FinFET is greater than the fin width of the channel region of the n-type FinFET.

REFERENCES:
patent: 5557231 (1996-09-01), Yamaguchi et al.
patent: 6864519 (2005-03-01), Yeo et al.
patent: 6943405 (2005-09-01), Bryant et al.
patent: 6977837 (2005-12-01), Watanabe et al.
patent: 7164175 (2007-01-01), Kawasaki et al.
patent: 2005/0094434 (2005-05-01), Watanabe et al.
patent: 2006/0105536 (2006-05-01), Cheng et al.
patent: 2007/0090468 (2007-04-01), Kawasaki et al.
patent: 2007/0108528 (2007-05-01), Anderson et al.
patent: 2007/0189060 (2007-08-01), Inaba
patent: 2008/0099834 (2008-05-01), Willer
patent: 2008/0308848 (2008-12-01), Inaba
patent: 2003-188273 (2003-07-01), None
patent: 2005-142289 (2005-06-01), None
patent: WO 2005/119763 (2005-12-01), None
U.S. Appl. No. 11/866,144, filed Oct. 2, 2007, Satoshi Inaba.
E. J. Nowak, et al. “A Functional FinFET-DGCMOS SRAM Cell”, International Electron Devices Meeting (IEDM), Tech., Dig., Dec. 2002, pp. 411-414.
U.S. Appl. No. 12/556,152, filed Sep. 9, 2009, Inaba.
U.S. Appl. No. 12/494,885, filed Jun. 30, 2009, Inaba.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor device including n-type and p-type FinFET's... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor device including n-type and p-type FinFET's..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor device including n-type and p-type FinFET's... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2663935

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.