Fabrication of nanowires and nanodevices

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

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C257SE21132, C977S890000

Reexamination Certificate

active

07968433

ABSTRACT:
Methods of fabricating nanowire structures and nanodevices are provided. The methods involve photolithographically depositing a nucleation center on a crystalline surface of a substrate, generating a nanoscale seed from the nucleation center, and epitaxially growing a nanowire across at least a portion of the crystalline surface starting at a nucleation site where the nanoscale seed is located.

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