Photomask unit, exposing method and method for manufacturing...

Details Photomask unit, exposing method and method for manufacturing... Photomask unit, exposing method and method for manufacturing...

2011-06-14

2011-06-14

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C359S359000

Reexamination Certificate

active

07960075

ABSTRACT:
A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle θ (0°<θ<90°) is higher than transmittance of incident light of an incident angle 0°.

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patent: 7271950 (2007-09-01), Gordon et al.
patent: 2004/0137371 (2004-07-01), Garza et al.
patent: 2009/0059189 (2009-03-01), Goehnermeier et al.
patent: 60-11843 (1985-01-01), None
patent: 7-199451 (1995-08-01), None

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