Pellicle for photolithography and pellicle frame

Details Pellicle for photolithography and pellicle frame Pellicle for photolithography and pellicle frame

2011-04-19

2011-04-19

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C428S014000

Reexamination Certificate

active

07927763

ABSTRACT:
There is disclosed a pellicle1for photolithography comprising, a pellicle frame2for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2of a surface area of the frame, and a pellicle film3that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.

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patent: A-2001-350253 (2001-12-01), None
patent: A 2003-57804 (2003-02-01), None

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