Multi-fin multi-gate field effect transistor with tailored...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S330000, C257SE27014

Reexamination Certificate

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07888750

ABSTRACT:
Disclosed are embodiments of an improved multi-gated field effect transistor (MUGFET) structure and method of forming the MUGFET structure so that it exhibits a more tailored drive current. Specifically, the MUGFET incorporates multiple semiconductor fins in order to increase effective channel width of the device and, thereby, to increase the drive current of the device. Additionally, the MUGFET incorporates a gate structure having different sections with different physical dimensions relative to the semiconductor fins in order to more finely tune device drive current (i.e., to achieve a specific drive current). Optionally, the MUGFET also incorporates semiconductor fins with differing widths in order to minimize leakage current caused by increases in drive current.

REFERENCES:
patent: 6909147 (2005-06-01), Aller et al.
patent: 7094650 (2006-08-01), Chaudhary et al.
patent: 7098502 (2006-08-01), Mathew et al.
patent: 7560785 (2009-07-01), Yu et al.
patent: 2002/0113277 (2002-08-01), Mehrotra et al.
patent: 2005/0215014 (2005-09-01), Ahn et al.
patent: 2009/0057780 (2009-03-01), Wong et al.
U.S. Appl. No. 11/556,844, filed Nov. 6, 2006, Schepis, et al., Pending Publication.

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