Image sensor with backside passivation and metal layer

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S291000, C257S369000, C257S440000, C257S461000, C257S432000

Reexamination Certificate

active

08008695

ABSTRACT:
An image sensor includes a semiconductor layer that low-pass filters light of different wavelengths. For example, the semiconductor layer proportionately absorbs photons of shorter wavelengths and proportionately passes more photons of longer wavelengths such that the longer wavelength photons often pass through without being absorbed. An imaging pixel having a photodiode is formed on a front surface of the semiconductor layer, where the photodiode is an N−region formed within the P-type region of the semiconductor layer. A P+layer is formed between the N−region of the photodiode and a back surface of the semiconductor layer. A mirror that primarily reflects photons of red and/or infra-red wavelengths is formed on the back surface of the semiconductor layer.

REFERENCES:
patent: 6107107 (2000-08-01), Bruce et al.
patent: 6388301 (2002-05-01), Tawada et al.
patent: 6504196 (2003-01-01), Rhodes
patent: 2003/0025160 (2003-02-01), Suzuki et al.
patent: 2003/0170928 (2003-09-01), Shimozono et al.
patent: 2007/0023799 (2007-02-01), Boettiger
patent: 2007/0138470 (2007-06-01), Alieu et al.
patent: 2008/0283726 (2008-11-01), Uya et al.

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