Method for forming a laminated structure having a...

Details Method for forming a laminated structure having a... Method for forming a laminated structure having a...

2011-08-23

2011-08-23

Hu, Shouxiang (Department: 2811)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S151000, C438S585000, C438S665000, C257SE21174, C257SE21159

Reexamination Certificate

active

08003533

ABSTRACT:
A disclosed laminated structure includes a wettability-variable layer containing a wettability-variable material whose surface energy changes when energy is applied thereto and including at least a high-surface-energy area having high surface energy and a low-surface-energy area having low surface energy; and a conductive layer formed on the high-surface-energy area. The high-surface-energy area includes a first area and a second area extending from the first area and having a width smaller than that of the first area.

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U.S. Appl. No. 12/144,079, filed Jun. 23, 2008, Yamaga, et al.

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