Positive tone bi-layer method

Details Positive tone bi-layer method Positive tone bi-layer method

2011-05-24

2011-05-24

Lee, Calvin (Department: 2892)

Semiconductor device manufacturing: process

Chemical etching

Combined with coating step

C216S044000

Reexamination Certificate

active

07947608

ABSTRACT:
Methods of imprint lithography are described. Generally, the methods include imprinting, via a patterned mold, a pattern into a polymerizable fluid composition on a substrate to form a patterned imprinting layer. A conformal layer is overlayed on the patterned imprinting layer. A portion of the conformal layer is used as a hard mask for subsequent processing. The imprinted pattern may be transferred to the substrate by a plurality of etches.

REFERENCES:
patent: 6814879 (2004-11-01), Shibata
patent: 7261831 (2007-08-01), Sreenivasan
patent: 7858528 (2010-12-01), Sreenivasan

Affiliated with

Also associated with

Rating

Positive tone bi-layer method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive tone bi-layer method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive tone bi-layer method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2619629