Photodelineable coatings from hydrogen silsesquioxane resin

Details Photodelineable coatings from hydrogen silsesquioxane resin Photodelineable coatings from hydrogen silsesquioxane resin

1993-03-22

1994-09-20

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522148, 4273762, 427517, 427519, G03C 172, C08J 328, B05D 302

Patent

active

053488393

ABSTRACT:
Disclosed are compositions which are useful for forming photodelineable coatings on substrates. The compositions contain a solvent, hydrogen silsesquioxane resin and an initiator which generates free radicals upon exposure to radiation.

REFERENCES:
patent: 3615272 (1971-10-01), Collins et al.
patent: 4693960 (1987-09-01), Bubich et al.
patent: 4826943 (1989-05-01), Ito et al.
patent: 4889901 (1989-12-01), Sharma et al.
patent: 4939065 (1990-07-01), Cavezzan et al.

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