Liquid crystal display device fabrication methods with reduced n

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

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438149, 438158, H01L 2100

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active

059465476

ABSTRACT:
Liquid crystal display (LCD) devices are fabricated by forming a patterned gate layer on a substrate and forming an insulating layer, a semiconductor layer and a conductive layer on the patterned gate layer. The conductive layer is patterned to define a data line, a source electrode, a drain electrode and a pixel electrode for the LCD device. A passivation layer is formed on the patterned conductive layer. The passivation layer is removed from on at least a portion of the pixel electrode. At least a portion of the semiconductor layer between the data line and the pixel electrode is also simultaneously removed. LCD devices may thereby be fabricated with reduced numbers of patterning steps compared to conventional fabrication methods.

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