Photolithographic method and combination including barrier layer

Details Photolithographic method and combination including barrier layer Photolithographic method and combination including barrier layer

1984-09-04

1987-05-05

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430333, 430334, 430339, 430273, 430156, 430325, 430326, 430327, G03C 1495, G03C 1727

Patent

active

046632751

ABSTRACT:
Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also water-soluble and is also removed simultaneously with development.

REFERENCES:
patent: 3567445 (1971-03-01), Atkinson et al.
patent: 3652273 (1972-03-01), Htoo
patent: 3965278 (1976-06-01), Duinker et al.

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