Method for forming a step on a deposition surface of a substrate

Details Method for forming a step on a deposition surface of a substrate Method for forming a step on a deposition surface of a substrate

1995-02-24

1997-04-08

Schilling, Richard L.

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 76, 505329, 505412, C25F 300, B44C 122

Patent

active

056184468

ABSTRACT:
The present invention relates to a method for foxing a step on a deposition surface of a substrate for depositing a thin film on it. According to the method, the step is formed by etching a portion of the deposition surface of the substrate by emitting a laser beam to the portion.

REFERENCES:
patent: 4900892 (1990-02-01), Baeuerle et al.
patent: 5439875 (1995-08-01), Tanaka et al.

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