Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-03-21
1997-04-08
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118500, 156345, C23C 1600
Patent
active
056183500
ABSTRACT:
A receptacle terminal is provided at a mount table and comprised of a downwardly opened electroconductive cap member. The receptacle terminal is connected to a heating element of a heater. A plug terminal is forced into the receptacle terminal and has an electroconductive section, support section and insulating pipe. The insulating pipe is provided around the circumference of the support section. A first clearance is defined between the support section and the inner wall of the insulating pipe. A second clearance is defined between the end face of the electroconductor section and that of the insulating pipe. The lower end portions of the support section and insulating pipe extend out of a processing chamber via a hole in the bottom plate of the processing chamber. A gas supply attachment is provided around the circumference of the insulating pipe and has a cavity including the circumferential portion of the insulating pipe and communicating with a gas supply pipe. The cavity communicates with the first clearance via a hole partially provided in the insulating pipe at the cavity. The gas supply pipe communicating with the cavity is connected to an inert gas supply source. The inert gas is supplied from an inert gas supply source to a region near a contacting area of the receptacle terminal and plug terminal past the cavity, first clearance and second clearance.
REFERENCES:
patent: 5063031 (1991-11-01), Sato
patent: 5231690 (1993-07-01), Soma
patent: 5280156 (1994-01-01), Niori
patent: 5310452 (1994-05-01), Doki
patent: 5342471 (1994-08-01), Fukasawa
Arami Jun-ichi
Ishikawa Kenji
Bueker Richard
Tokyo Electron Limited
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