Process for sputtering multilayers for magneto-optical recording

Details Process for sputtering multilayers for magneto-optical recording Process for sputtering multilayers for magneto-optical recording

1989-11-27

1991-11-26

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, C23C 1434

Patent

active

050680226

ABSTRACT:
An improved sputtering process for making a platinum/cobalt (Pt/Co) multilayer film comprised of alternating layers of platinum and cobalt, said improvement comprising using as the sputter gas krypton, xenon or a mixture thereof.

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patent: 4766034 (1988-08-01), Sato et al.
Zeper et al., J. Appl. Phys. 65, 4971 (1989).
Greidanus, Appl. Phys. Lett. 54, 2481 (1989).
Ochiai et al., Jap. J. Appl. Phys. 28, L659 (1989).
Ochiai et al., Digest of the Int'l Mag. Conf.-1989, Wash., D.C.
Hashimoto et al., J. Appl. Phys. 66(10), 4909 (1989).

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