Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1993-02-26
1994-10-18
Breneman, R. Bruce
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156633, 156634, 156637, C23F 100
Patent
active
053565169
ABSTRACT:
An etching process using dicarboxylic and tricarboxylic acids as chelating etchants for mixed metal oxide films such as high temperature superconductors and ferroelectric materials. Undesirable differential etching rates between different metal oxides are avoided by selection of the proper acid or combination of acids. Feature sizes below one micron, excellent quality vertical edges, and film thicknesses in the 100 Angstom range may be achieved by this method.
REFERENCES:
patent: 3887403 (1975-06-01), Cogsins
patent: 4759823 (1988-07-01), Asselanis
patent: 4997522 (1991-03-01), Shokoohi
patent: 5106454 (1992-04-01), Allardyce
Shokoohi, Schiavone, Rogers, Inam, Wu, Nazar and Venkatesan, "Wet Chemical etching of high Tc superconductors by EDTA" pp. 1299-1302.
Mat. Res. Soc. Symp. Proc. vol. 169 1990 Materials Research Society "Improved Aqueous Etchant for High Tc Superconductor Materials", Ashby et al. Appl. Phys. Lett. 60(17), 27 Apr. 1992 2147-2149.
"Machining of PZT, PT and (Mn,Zn)Fe.sub.2 O.sub.4 Ceramics by Laser--Induced Chemical Etching" Tadashi Shiosaki, Japanese Journal of Applied Physics, vol. 26 (1987) Supplement 26-2, pp. 159-161.
Ashby Carol I. H.
Ginley David S.
Breneman R. Bruce
Chang Joni
Cone Gregory A.
Sandia Corporation
LandOfFree
Process for etching mixed metal oxides does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for etching mixed metal oxides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for etching mixed metal oxides will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2370040