Method of eliminating carbon material by chemical vapor reaction

Details Method of eliminating carbon material by chemical vapor reaction Method of eliminating carbon material by chemical vapor reaction

1990-09-14

1991-05-21

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 156655, 252 791, 20419235, B44C 122, C03C 1500, C03C 2506

Patent

active

050172646

ABSTRACT:
An etching method for eliminating carbon material is described. After disposing a substrate to be treated in a CVD reaction chamber, NF.sub.3 is admitted to the chamber and converted into a plasma etchant comprising fluorine ions or radicals by inputting high frequency energy. The carbon material elimination can be applied for chamber cleaning so as to removing carbon deposited debris from the inside of the chamber.

REFERENCES:
patent: 4053350 (1977-10-01), Olsen et al.
patent: 4620898 (1986-11-01), Banks et al.
patent: 4816113 (1989-03-01), Yamazaki

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