Method and apparatus for evaluating surface conditions of a samp

Thermal measuring and testing – Leak or flaw detection – With heating or cooling of specimen for test

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356357, 356445, 374 57, G01N 2141, G01N 2500

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046360883

ABSTRACT:
An apparatus and method is disclosed for evaluating surface conditions on a sample. The system is particularly suited for detecting thin residues encountered in semiconductor lithographic and etching processes. The system is also capable of measuring ion implanted dopant concentrations prior to annealing. The apparatus includes an intensity modulated laser beam which is focused on the surface of the sample to generate periodic heating. A second light beam is focused onto the periodically heated area of the sample in a manner such that it is reflected to a detector. The intensity changes in the probe beam, resulting from the temperature induced changes of reflectivity at the surface of the sample, are measured and evaluated to determine the absence or presence of residues, or to measure the concentrations of ion implanted dopants.

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