Method of minimizing surface effects in thin ferroelectrics

Details Method of minimizing surface effects in thin ferroelectrics Method of minimizing surface effects in thin ferroelectrics

1994-04-07

1998-01-06

Jordan, Charles T.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C23L 1400

Patent

active

057050414

ABSTRACT:
A method of improving the responsivity of a pyroelectric device including providing a pyroelectric element of less than maximum theoretical density having holes therein extending to a surface of the element and having contaminants at the surface (22), cleaning the contaminants from the surface and metallizing the surface prior to contaminant reformation on the surface. The pyroelectric element is preferably a ferroelectric element and preferably barium strontium titanate. The step of cleaning can be by oxygen plasma, acid etch or a combination thereof. When the combination of cleaning steps is used, the step of cleaning comprises etching the surface and then oxygen cleaning the surface.

REFERENCES:
patent: 5578867 (1996-11-01), Argos, Jr. et al.

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