Photosensitive composition

Details Photosensitive composition Photosensitive composition

1992-03-24

1993-07-13

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 522102, 522116, 522120, G03C 173

Patent

active

052272796

ABSTRACT:
Disclosed is a polymer having a group represented by the following formula (I) or (II) in a side chain on a main chain consisting of carbon-carbon bonds: ##STR1## [wherein X is an oxygen atom, a sulfur atom or N--R.sup.1, R.sup.1 is a hydrogen atom, an alkyl group containing 1 to 3 carbon atoms or CH.sub.2 CO.sub.2 H], said group being decarboxylated by photo-reaction of its own or by photo-reaction with a photo-sensitizer which absorbs light to generate a free radical.

REFERENCES:
patent: 4485167 (1984-11-01), Briney et al.
patent: 4517281 (1985-05-01), Briney et al.
Derwent Abstracts, World Patents Index, File 351, Abstract of DE3825738.

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