Method and apparatus for applying a layer of a fluid material on

Details Method and apparatus for applying a layer of a fluid material on Method and apparatus for applying a layer of a fluid material on

1990-04-24

1992-03-10

Bell, Janyce

Coating processes

Centrifugal force utilized

118 52, 118320, 118321, 427421, 437231, B05D 312, B05C 1102

Patent

active

050948849

ABSTRACT:
An apparatus and method is disclosed for applying a uniform layer of a fluid material such as photoresist onto the surface of a rotating workpiece such as a semiconductor wafer. A dispensing nozzle is provided with a rectangular or oblong shaped opening for painting a broad swath of the fluid material onto the surface of the workpiece while the nozzle moves along a radial path inwardly from the peripheral edge of the workpiece. The use of a rectangular or oblong shaped nozzle opening minimizes the amount of fluid material being consumed while providing a uniform thin film coating on the workpiece surface.

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