Methods, complexes and system for forming metal-containing films

Details Methods, complexes and system for forming metal-containing films Methods, complexes and system for forming metal-containing films

1998-04-20

2000-10-10

Bowers, Charles

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438688, H01L 2144

Patent

active

061301604

ABSTRACT:
A method of forming a film on a substrate using Group IIIA metal complexes. The complexes and methods are particularly suitable for the preparation of semiconductor structures using chemical vapor deposition techniques and systems.

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