Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

1997-02-04

2000-10-10

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118728, C23C 1600

Patent

active

061290467

ABSTRACT:
The present invention provides a substrate processing apparatus having improved temperature distribution on a block heater and improved productivity. The substrate processing apparatus includes a reactor having an exhaust unit to form a vacuum environment therein for processing a surface of a substrate, a support member provided in the reactor, and gas introduction units for introducing reactive gases into the reactor, the substrate support member including a block heater. The block heater has upper, intermediate and lower members, which are placed one over another, the faying surfaces of the respective members being joined by diffusion bonding. A heating member is provided between the intermediate and lower members, and purge gas passages are formed between the intermediate and upper members.

REFERENCES:
patent: 5230741 (1993-07-01), van de Ven et al.
patent: 5374594 (1994-12-01), van de Ven et al.
patent: 5792304 (1998-08-01), Tamura
Metals Handbook, 9.sup.th Ed. , vol. 6, PS G5 .COPYRGT.1983 American Society for Metals, Metals Park, Ohio.

Affiliated with

Also associated with

Rating

Substrate processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Substrate processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Substrate processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2249350