Pattern transfer techniques for fabrication of lenslet arrays us

Details Pattern transfer techniques for fabrication of lenslet arrays us Pattern transfer techniques for fabrication of lenslet arrays us

1996-03-14

1998-03-03

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

216 26, G03F 740

Patent

active

057232644

ABSTRACT:
In a method for forming lenslets which collect light and focus it onto photosensitive elements of an electronic imager includes providing a transparent lenslet-forming layer on a substrate or on layers on the substrate,
(a) providing a transparent polyester lenslet-forming layer on a substrate or on layer(s) on the substrate, the polyester containing repeat units, in part, having the structure ##STR1## wherein: n is 2 or greater;
x is selected from the group consisting of H, CH.sub.3, Br and Cl; and
Z is selected from the group consisting of nil, O, S, CH.sub.2, C.dbd.O, SO, SO.sub.2, CH--CH.sub.3, CH.sub.3 --C--CH.sub.3, CF.sub.3 --C--CF.sub.3, CH.sub.3 --C--CH.sub.2 CH.sub.3, ##STR2## (b) forming a thin etch-stop layer on the transparent lenslet-forming layer and patterning the etch-stop layer to form a mask so that the pattern corresponds to lenslets to be formed;
(c) anisotropically plasma etching the transparent lenslet-forming layer according to the pattern;
(d) removing the thin etch-stop mask; and
(e) thermally reflowing the patterned transparent layer to form the transparent lenslets.

REFERENCES:
patent: 4689291 (1987-08-01), Popovic et al.
patent: 5605783 (1997-02-01), Revelli et al.
Y. Ishihara et al, "A High Photosensitivity IL-CCD Image Sensor with Monolithic Resin Lens Array," International Electron Devices Meeting, 1983, pp. 497-500.

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