Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1992-07-06
1993-08-17
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430330, 430394, G03C 516
Patent
active
052368114
ABSTRACT:
A method of producing a .lambda./4 shifted diffraction grating, includes applying an image reversible resist on a substrate on which a diffraction grating is to be formed, exposing a predetermined with light of a first predetermined region of the resist with light of a first predetermined energy, exposing all of the resist with light interference fringes of a second predetermined energy, baking, and thereafter developing the image reversible resist.
REFERENCES:
patent: 3888672 (1975-06-01), Lee
patent: 4269933 (1981-05-01), Pazos
patent: 4530736 (1985-07-01), Mutter
patent: 4595651 (1986-06-01), Grossa
patent: 4782035 (1988-11-01), Fujiwara
patent: 4806454 (1989-02-01), Yoshida et al.
patent: 4814243 (1989-03-01), Ziger
patent: 4885231 (1989-12-01), Chan
Sze "Semiconductor Devices--Physics & Technology" pp. 428-458.
Angebranndt Martin
Bowers Jr. Charles L.
Mitsubishi Denki & Kabushiki Kaisha
LandOfFree
Method of producing a .lambda./4-shifted diffraction grating does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of producing a .lambda./4-shifted diffraction grating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of producing a .lambda./4-shifted diffraction grating will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2243114