High resolution lithographic resist of negative working cationic

Details High resolution lithographic resist of negative working cationic High resolution lithographic resist of negative working cationic

1983-04-04

1984-06-26

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430296, 430322, 20415922, 525336, 526248, 526265, 526259, G03C 168

Patent

active

044566786

ABSTRACT:
A negative working resist composition and medium for microlithographic recording comprises a vinyl polymer having aromatic quaternized nitrogen-containing pendant groups. The resist undergoes a transformation from high to low solubility in polar solvents such as water or low molecular weight alcohols upon exposure to electron beams, ultraviolet light, or X-rays. A method for patterning substrates by employing the resist composition is also disclosed.

REFERENCES:
patent: 2732350 (1956-01-01), Clarke
patent: 3682339 (1972-08-01), Webster et al.
patent: 3936429 (1976-02-01), Seoka et al.
patent: 4046766 (1977-09-01), Costin
patent: 4322489 (1982-03-01), Land et al.
Ohnishi, J. Vac. Sci. Technol. 19(4), Dec./1981, pp. 1136-1140.

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