Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1979-08-20
1981-01-13
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415911, 20415918, 20415923, 20415924, 430281, 430286, 430288, 528 90, G03C 168
Patent
active
042450292
ABSTRACT:
Photocurable compositions are provided based on the use of particular triarylsulfonium salts as photoinitiators for certain oxirane containing aliphatically unsaturated organic resins, such as acrylics, or mixtures of vinyl aromatic and unsaturated polyesters. A simultaneous free-radical cure and cationic cure of the aforesaid organic resins are achieved, which provides improved results, such as metal coatings having improved solvent resistance.
REFERENCES:
patent: 3721616 (1973-03-01), Watt
patent: 3790385 (1974-02-01), Steppan
patent: 3816280 (1974-06-01), Watt
patent: 3816281 (1974-06-01), Feinberg
patent: 3895952 (1975-07-01), Schlesinger
patent: 4058400 (1977-11-01), Crivello
patent: 4058401 (1977-11-01), Crivello
patent: 4156055 (1979-05-01), Taso
Ketley et al., Polymer Preprints, 19(E) 656 (1978) ACS Meeting, Miami, Fla. Sep. 1978.
Brammer Jack P.
Davis Jr. James C.
General Electric Company
Teoli William A.
LandOfFree
Photocurable compositions using triarylsulfonium salts does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photocurable compositions using triarylsulfonium salts, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photocurable compositions using triarylsulfonium salts will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2231982