Resist composition containing dialkyl malonate in base polymer

Details Resist composition containing dialkyl malonate in base polymer Resist composition containing dialkyl malonate in base polymer

1999-05-18

2000-09-05

Sanders, Kriellion

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

524251, 430170, 4302701, 430905, 430910, C08K 320, G03F 7039

Patent

active

061144223

ABSTRACT:
A resist composition including (a) a polymer used in a chemically amplified resist and represented by the following formula: ##STR1## wherein R.sub.1 is selected from the group consisting of --H and --CH.sub.3, R.sub.2 is selected from the group consisting of t-butyl, tetrahydropyranyl and 1-alkoxyethyl groups, x is an integer of 1 to 4, and k/(k+1) is 0.5 to 0.9, and (b) 1-15% by weight of a photoacid generator (PAG) on the basis of the weight of the polymer.

REFERENCES:
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5663035 (1997-09-01), Masuda et al.
patent: 5733704 (1998-03-01), Choi et al.

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