Substrate processing apparatus

Details Substrate processing apparatus Substrate processing apparatus

1998-02-12

2000-06-06

Raimund, Christopher

Coating apparatus

Gas or vapor deposition

With treating means

118723R, C23C 1600

Patent

active

060705523

ABSTRACT:
A substrate processing device includes a reactor equipped with a substrate holder and a gas feed electrode facing the substrate holder, a pump mechanism for pumping out an interior of the reactor, a reaction gas feed mechanism for introducing a reaction gas through the gas feed electrode into the interior of said reactor, a high frequency power source for applying a high frequency power to said gas feed electrode, a connecting port formed in a sidewall of said reactor, the pump mechanism is connected to the connecting port formed in the sidewall of the reactor, and a space between the gas feed electrode and the substrate holder is set so that a conductance between the gas feed electrode and the substrate holder is lower than a conductance between the sidewall of the reactor and the gas feed electrode.

REFERENCES:
patent: 5456757 (1995-10-01), Aruga et al.
patent: 5589233 (1996-12-01), Law et al.

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