Low distortion stencil mask

Details Low distortion stencil mask Low distortion stencil mask

1996-11-20

1998-06-09

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430396, G03F 900

Patent

active

057631212

ABSTRACT:
A stencil mask (10) has a membrane (14) under tensile stress and at least one pattern opening (22) formed through the membrane (14). A plurality of stress relief openings (30) are formed in the membrane for reducing stress-induced distortion of the membrane and the mask pattern. The stress relief openings (30) are positioned to relieve concentrations of stress within the membrane (14) such as those resulting from non-regularities within the pattern. In one embodiment, a screening material (56), less rigid than the membrane (14), is contained within the stress relief openings (30).

REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 4342817 (1982-08-01), Bohlen et al.
patent: 4468799 (1984-08-01), Harms et al.
patent: 4647517 (1987-03-01), Hersener et al.
patent: 4708919 (1987-11-01), Shimkunas et al.
patent: 4780382 (1988-10-01), Stengl et al.
patent: 4827138 (1989-05-01), Randall
patent: 4855195 (1989-08-01), Zapka et al.

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