Method for forming a stable plasma

Details Method for forming a stable plasma Method for forming a stable plasma

1994-07-27

1995-08-15

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

H05H 100

Patent

active

054415969

ABSTRACT:
A method for forming a stable plasma, particularly in the high power and low pressure ranges. The method may be used in a plasma system such as that used for a plasma etch. First, the radio frequency power is turned on under low power and high pressure. The plasma is allowed to stabilize without tuning. Next, the pressure is dropped to the desired operating level and the tuning system is engaged. After tuning at the low power and low pressure, the radio frequency power is ramped to the desired level. Finally, the system is again tuned at the higher power.

REFERENCES:
patent: 4679007 (1987-07-01), Reese et al.
patent: 4808258 (1989-02-01), Otsubo et al.
patent: 5223457 (1993-06-01), Mintz et al.
patent: 5288971 (1994-02-01), Knipp

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