Photosensitive trihalomethyl-s-triazine compound and photopolyme

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430919, 430920, 522 52, 522 63, G03C 1725, G03F 705

Patent

active

054894999

ABSTRACT:
A photosensitive trihalomethyl-s-triazine compound and a photopolymerizable composition containing the photosensitive trihalomethyl-s-triazine compound. The photosensitive trihalomethyl-s-triazine compound is represented by formula (I): ##STR1## wherein X represents a chlorine atom or a bromine atom; Y represents an alkyl group, a CF.sub.3 group, a CF.sub.2 Cl group, an alkyl group substituted with a group or an atom other than hydrogen atoms, a C.sub.6 F.sub.5 group, or a group represented by --Z--CO--OR.sup.3 or --C.sub.6 H.sub.4 --R.sup.4, in which R.sup.3 represents a hydrogen atom or alkyl group, Z represents --C.sub.2 H.sub.4 --, --C.sub.3 H.sub.6 --, --CH.dbd.CH--, or o-phenylene group, and R.sup.4 represents a hydrogen atom, a hydroxyl group, an alkyl group, a substituted alkyl group, an aryl group, an alkoxy group, a substituted alkoxy group, a halogen atom, an alkoxycarbonyl group, a cyano group, an acyl group, a nitro group, a formyl group, a mercapto group, an alkylthio group, or a dialkylamino group; R.sup.1 and R.sup.2 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, an alkoxy group, a substituted alkoxy group, an acyloxy group, a halogen atom, an alkoxycarbonyl group, a cyano group, a nitro group, a carboxyl group, or a group represented by formula (II) or (III): ##STR2## wherein R.sup.5 and R.sup.6 each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, or a substituted aryl group, ##STR3## wherein R.sup.7 and R.sup.8 each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or an acyl group, and wherein R.sup.5 and R.sup.7 may be connected to R.sup.6 and R.sup.8 respectively, to form a ring.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 4774163 (1988-09-01), Higashi
patent: 4837128 (1989-06-01), Kawamur et al.
patent: 4937161 (1990-06-01), Kita et al.
patent: 4987055 (1991-01-01), Rode et al.
patent: 5059511 (1991-10-01), Higashi et al.
patent: 5202361 (1993-04-01), Zimmermann et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive trihalomethyl-s-triazine compound and photopolyme does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive trihalomethyl-s-triazine compound and photopolyme, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive trihalomethyl-s-triazine compound and photopolyme will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2174424

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.