Photopolymerizable resin composition for producing aqueous-devel

Details Photopolymerizable resin composition for producing aqueous-devel Photopolymerizable resin composition for producing aqueous-devel

1985-04-03

1987-09-08

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 430288, 430281, 430285, 522114, 522121, 522 95, 522 44, 522 43, 522 46, 522 47, G03C 168, C08F 800

Patent

active

046923969

ABSTRACT:
A photopolymerizable resin composition for aqueous-developing type dry film resists which comprises

REFERENCES:
patent: 3475171 (1969-10-01), Alles
patent: 3804631 (1974-04-01), Faust
patent: 3833384 (1974-09-01), Noonan et al.
patent: 3895949 (1975-07-01), Akamatsu et al.

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