Plasma apparatus

Details Plasma apparatus Plasma apparatus

1995-11-03

1997-06-17

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118723R, 118723FI, 156345, 20429831, 20429836, 20429837, 250423R, 31511141, 31511171, 31511181, C23C 1648, C23F 102, H05H 116, H01J 2720

Patent

active

056393083

ABSTRACT:
A plasma apparatus generates plasma by introducing electron beams into a processing chamber filled with a reactive gas for irradiation of the reactive gas with the introduced electron beams, to process a substance by the generated plasma. The plasma apparatus has a sample base for mounting the substance to be processed so that a processing surface of the substance is not directed in a direction perpendicular to a travel direction of the electron beams introduced into the processing chamber; a suppressing section for suppressing divergence of the electron beams introduced into the processing chamber; and a control section for controlling current density distribution of the divergence-suppressed electron beams so that current density distribution of ions contained in the plasma can be uniformalized on the substance to be processed.

REFERENCES:
patent: 4657619 (1987-04-01), O'Donnell
patent: 4749910 (1988-06-01), Hara et al.
patent: 5009922 (1991-04-01), Harano et al.
patent: 5217761 (1993-06-01), Okada et al.
patent: 5340621 (1994-08-01), Matsumoto et al.

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