Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-06-24
2000-12-12
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430170, 430176, 430905, G06F 7004, G06F 7021
Patent
active
061596566
ABSTRACT:
The present invention provides a positive photosensitive resin composition which, when exposed to far ultraviolet rays, in particular, ArF excimer laser light, shows excellent performances especially with respect to the residual film ratio, resist profile, resolution, and dry-etching resistance and does not pose the problem of development defects. The positive photosensitive resin composition comprising:
(A) a compound which generates an acid upon irradiation with actinic rays,
(B) a polymer having specific structures represented by formula (Ia), (Ib), (Ic) or (Id) defined in the specification,
(C) a nitrogen-containing basic compound, and
(D) at least one of a fluorine type surfactant and a silicone type surfactant.
REFERENCES:
patent: 5128232 (1992-07-01), Thackeray et al.
patent: 5707776 (1998-01-01), Kawabe et al.
patent: 5837419 (1998-11-01), Ushirogouchi et al.
patent: 5928818 (2000-05-01), Mertesdorf et al.
patent: 6063542 (2000-05-01), Hyeon et al.
Aoai Toshiaki
Kawabe Yasumasa
Sato Kenichiro
Chu John S.
Fuji Photo Film Co. , Ltd.
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