Positive photoresist composition for exposure to far ultraviolet

Details Positive photoresist composition for exposure to far ultraviolet Positive photoresist composition for exposure to far ultraviolet

1999-03-08

2000-12-12

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430910, 430905, 430914, G03C 173, G03C 172

Patent

active

061596558

ABSTRACT:
A positive photoresist composition position for exposure to far ultraviolet light, which comprises a resin decomposing by the action of an acid to increase its solubility in an alkali, and a compound generating an acid by irradiation with an actinic ray or radiation; with the resin comprising repeating units having particular structures, including particular alicyclic structures, and groups decomposing by the action of an acid.

REFERENCES:
patent: 6013416 (2000-01-01), Nozaki et al.

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