Solid state image sensing device for enhanced charge carrier acc

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357 24M, 357 30, H01L 2978, H01L 2714, H01L 3100

Patent

active

043853072

ABSTRACT:
A so-called buried channel type solid state image sensing device is formed with a channel layer of the opposite conductivity type in the surface of a semiconductor substrate. An insulating layer is formed on the surface of the semiconductor substrate and spaced apart photo-electrode and a charge transfer electrode are buried in the insulating film and a shift electrode is buried therebetween. A channel layer is provided beneath the photoelectrode and the charge transfer electrode whereas no channel layer is formed beneath the shift electrode. But instead a portion of the surface of the semiconductor substrate is located beneath the shift electrode. Since no channel layer is provided beneath the shift electrode, a sufficient quantity of charge carriers is accumulated in a potential well formed in the channel layer beneath the photoelectrode.

REFERENCES:
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patent: 3866067 (1975-02-01), Amelio
patent: 3896474 (1975-07-01), Amelio et al.
patent: 3896485 (1975-07-01), Early
patent: 3995302 (1976-11-01), Amelio
patent: 4001878 (1977-01-01), Weimer
patent: 4028716 (1977-06-01), van Santen et al.
patent: 4143389 (1979-03-01), Kolke et al.
patent: 4155094 (1979-05-01), Ohba et al.

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