Plasma polymer antireflective coating

Details Plasma polymer antireflective coating Plasma polymer antireflective coating

1993-03-01

1995-08-22

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430317, 430329, 216 48, 216 37, 216 67, G03F 700

Patent

active

054439418

ABSTRACT:
An antireflective coating used in the photolithography process is applied and removed in a plasma reactor. The halocarbon plasma polymer such as fluorocarbon plasma polymer of the present invention provides an improved antireflective coating.

REFERENCES:
patent: 4614433 (1986-09-01), Feldman
patent: 4668335 (1987-05-01), Mockler

Affiliated with

Also associated with

Rating

Plasma polymer antireflective coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma polymer antireflective coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma polymer antireflective coating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2141020