Polymer composition and resist material

Details Polymer composition and resist material Polymer composition and resist material

1996-12-19

1999-11-02

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430910, 525210, 525216, 525219, 525221, 525238, G03F 7004

Patent

active

059767596

ABSTRACT:
A polymer composition comprising (i) a polymer (a) having a monomer unit containing a functional group A which becomes alkali-soluble by heating in the presence of an acid, (ii) a polymer (b) having a monomer unit containing a functional group B which also becomes alkali-soluble, but less easily than the functional group A, by heating in the presence of an acid, and if necessary in addition to (i) and (ii) or in place of (ii), (iii) a phenolic compound having a weight-average molecular weight of 300 to 15,000 gives together with an photoacid generator a resist material suitable for forming a pattern excellent in sensitivity, resolution, mask linearity and other properties.

REFERENCES:
patent: 5468589 (1995-11-01), Urano et al.
patent: 5658706 (1997-08-01), Nlki et al.
patent: 5736296 (1998-04-01), Sato et al.

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