Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-01-14
1994-05-03
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429804, C23C 1434
Patent
active
053084616
ABSTRACT:
The present invention discloses a method to deposit thin films on a substrate. An inert gas is introduced into a radio-frequency excited ion beam gun. The ions thus produced are directed to a target where molecules of the target are sputtered off and deposited on a substrate. A method of translating different targets into the ion beam is provided in order to produce multilayer films with different properties in each layer. A method is also provided to rotate the substrates into and out of the path of the sputtered molecules to insure a uniform film.
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Brochure, "The RF-Ion Source Pris 10 with the RF-Induction Coil Placed Inside the Discharge Plasma", By J. Freisinger, J. Krempel-Hesse, J. Krumeich, H. Lob, W. D. Munz, and A. Scharmann, Published by Hauzer Techno Coating, Publication date unknown.
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Champion Ronald E.
Honeywell Inc.
Lervick Craig J.
Nguyen Nam
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