Chemical mechanical polishing with a small polishing pad

Details Chemical mechanical polishing with a small polishing pad Chemical mechanical polishing with a small polishing pad

1999-06-29

2000-12-12

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451287, B24B 722

Patent

active

061590800

ABSTRACT:
A chemical mechanical polishing apparatus includes a rotating plate on which a substrate is received, and a polishing pad which moves across the substrate as it rotates on the plate to polish the substrate. The load of the pad against the substrate, and the rotary speed of the plate, may be varied to control the rate of material removed by the pad.

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