Pellicle for protection of photolithographic mask

Details Pellicle for protection of photolithographic mask Pellicle for protection of photolithographic mask

1992-09-22

1997-11-25

Chapman, Mark

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428 45, 428343, 428355, G03F 900

Patent

active

056910886

ABSTRACT:
Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.

REFERENCES:
patent: 4996106 (1991-02-01), Nakagawa et al.
patent: 5095085 (1992-03-01), Hara et al.

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