Liquid material supply apparatus and method

Details Liquid material supply apparatus and method Liquid material supply apparatus and method

1995-06-27

1997-11-25

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118726, C23C 1600

Patent

active

056907435

ABSTRACT:
An apparatus for supplying a low vapor pressure liquid material for deposition to a deposition chamber in which the low vapor pressure liquid material is pushed out of a pressurization passage by a pressure gas to a pressure liquid supply passage; a flow rate of the low vapor pressure liquid material is controlled by a flow rate control unit, and the flow rate of the low vapor pressure liquid is supplied to an evaporator and evaporated into vapor there; and the vapor is fed to the deposition chamber through a vapor feed passage provided with heating means for preventing the vapor from re-liquefying, whereby the liquid material for deposition is supplied stably and accurately.

REFERENCES:
patent: 5203925 (1993-04-01), Shibuya
patent: 5250323 (1993-10-01), Miyazaki
patent: 5362328 (1994-11-01), Gardiner et al.
patent: 5372754 (1994-12-01), Ono
patent: 5383970 (1995-01-01), Asaba
patent: 5419924 (1995-05-01), Nagashima
patent: 5443644 (1995-08-01), Ozawa
patent: 5554226 (1996-09-01), Okase
patent: 5620524 (1997-04-01), Fan et al.

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