Heating device used for a gas phase growing mechanism or heat tr

Details Heating device used for a gas phase growing mechanism or heat tr Heating device used for a gas phase growing mechanism or heat tr

1995-01-19

1996-03-12

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118725, 392418, 432205, 432241, 432253, C23C 1600, F27B 109, F27B 504

Patent

active

054982928

ABSTRACT:
A heating device used for a gas phase growing mechanism or a heat treatment mechanism comprising a tubular reactor made of a heat resistant and chemically inert material incorporating a support having a plurality of works set and arranged thereon to be put to gas phase growing or heat treatment, a cylindrical main heating furnace body disposed so as to surround the outer circumferential surface of the tubular reactor 1 at the entire length thereof, and a pair of auxiliary heating furnace bodies each closing both longitudinal opening ends of the cylindrical main heating body, whereby the cylindrical main heating furnace body and the pair of auxiliary heating furnace bodies constitute a heating furnace for confining the tubular reactor therein.

REFERENCES:
patent: 4760244 (1988-07-01), Hokynar
patent: 5029554 (1991-07-01), Miyashita
patent: 5074954 (1991-12-01), Nishizawa
patent: 5164012 (1992-11-01), Hattori
patent: 5329095 (1994-07-01), Okase
patent: 5395452 (1995-03-01), Kobayashi

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