Method and apparatus for forming low dielectric constant polymer

Details Method and apparatus for forming low dielectric constant polymer Method and apparatus for forming low dielectric constant polymer

1998-09-21

2000-09-26

Meeks, Timothy

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

438780, C23C 16448

Patent

active

061239933

ABSTRACT:
A method and apparatus for forming a low dielectric constant polymeric film on a substrate, by liquid delivery of a parylene precursor reagent, in the form of an organic solution or a neat liquid, subsequent flash vaporization of the neat liquid or organic solution, pyrolytic "cracking" of the precursor to form the reactive monomer and/or reactive radical species, and condensation and polymerization of the monomer and/or reactive radical species to form a low dielectric constant polymeric film on the substrate. The low dielectric constant polymeric film may comprise a parylene film, formed from a precursor such as [2.2]paracyclophane, an alkyl- and/or halo-substituted derivative thereof, or an analogous compound of a p-xylene derivative.

REFERENCES:
patent: 5268202 (1993-12-01), You et al.
patent: 5902641 (1999-05-01), Affinito et al.
patent: 5958510 (1999-09-01), Sivaramakrishnam et al.
patent: 5966499 (1999-10-01), Hinkle et al.
Chow, et al. "Poly-(.alpha.,.alpha.,.alpha.,.alpha.-tetrafluoro-p-xylylene)", J. Appl. Polymer Sci., vol. 13, 1969, pp. 2325-2332 (no month).
Gorharn, "A New General Synthetic Method For The Preparation Of Linear Poly-P-Xylylenes", J. Polymer Sci., Part A-1, vol. 19, 1969, pp. 3027-3039 (no month).

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