Process for crystallizing an amorphous silicon film and apparatu

Details Process for crystallizing an amorphous silicon film and apparatu Process for crystallizing an amorphous silicon film and apparatu

1995-06-07

2000-06-13

Wilczewski, Mary

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438486, 438487, H01L 21225

Patent

active

060749016

ABSTRACT:
In a process for crystallizing an amorphous silicon film at a low temperature using a catalyst element, a system which automatically introduces the catalyst element into the amorphous silicon film is provided. The process steps are necessary for applying a solution containing an element which accelerates the crystallization of an amorphous silicon film are each effected in units 14 to 21. The substrate is transferred using a robot arm 12.

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