Etching a substrate: processes – Gas phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
Patent
1997-12-09
2000-06-13
Gulakowski, Randy
Etching a substrate: processes
Gas phase etching of substrate
Irradiating, ion implanting, alloying, diffusing, or...
216 64, 216 66, 216 67, 438708, 438725, 438735, B44C 122
Patent
active
06074569&
ABSTRACT:
A method for stripping photoresist used as an etch mask in carbon based reactive ion etching includes flood exposing a patterned photoresist with a light and cyclically exposing the photoresist with an oxygen plasma in between the carbon based plasma. The step of cyclically exposing occurs after the step of flood exposing. The step of flood exposing includes the step of decomposing photosensitive compounds in the photoresist, while the step of cyclically exposing includes the step of cyclically removing layers of the photoresist.
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Hu Ming
Kiziloglu Kursad
Duraiswamy V. D.
Gulakowski Randy
Hughes Electronics Corporation
Olsen Allan
Sales M.W.
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