Copper-base alloy cleaning solution

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 3, 134 41, 156656, 156657, 156666, 156667, 252 793, C23F 100, B44C 122, C03C 1500, C03C 2506

Patent

active

045811024

ABSTRACT:
The present invention relates to a cleaning solution for removing surface oxides from copper base alloys without significantly etching the copper-base alloy material. The cleaning solution comprises from about 1 v/o to about 50 v/o hydrofluoric acid and from about 5 v/o to about 50 v/o of at least one of sulfuric acid and hydrochloric acid. In a preferred embodiment, the cleaning solution consists essentially of from about 5 v/o to about 15 v/o hydrofluoric acid and from about 25 v/o to about 50 v/o sulfuric acid and the balance essentially water.

REFERENCES:
patent: 3598741 (1971-08-01), Kanno
patent: 3646946 (1972-03-01), Ford et al.
patent: 3728155 (1973-04-01), Ford et al.
patent: 3794523 (1974-02-01), Thompson
patent: 3804689 (1974-04-01), O'Connor
patent: 3860467 (1975-01-01), Lim
patent: 4002489 (1977-01-01), Hedqvist et al.
patent: 4009115 (1977-02-01), Binns
patent: 4105469 (1978-08-01), Megy et al.
patent: 4124407 (1978-11-01), Binns
patent: 4220706 (1980-09-01), Spak
ASM Committee, "Cleaning and Finishing of Copper and Copper Alloys", Metals Handbook, 8th Edition, vol. 2, pp. 635-647.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Copper-base alloy cleaning solution does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Copper-base alloy cleaning solution, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Copper-base alloy cleaning solution will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2064334

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.