Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-06-21
2000-11-14
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430914, 430921, 526281, 526272, G03F 7004, C08F 1000
Patent
active
06146810&
ABSTRACT:
A copolymer represented by the formula I and a chemical amplification resist containing the copolymer, which can be easily controlled in sensitivity by regulating the content and kind of the norbornene derivatives in the matrix polymers in addition to being superior in adherence to substrate and dry etch resistance: ##STR1## wherein, X is selected from the group consisting of the following general formulas II, III and IV; and, l, m, n and o each are a repeating number not more than 0.5, satisfying the condition that l+m+n+o=1 and 0.4.ltoreq.o.ltoreq.0.5: ##STR2##
REFERENCES:
patent: 5843624 (1998-12-01), Houlihan et al.
patent: 6048664 (2000-04-01), Houlihan et al.
Alicyclic Polymers for 193nm Resist Applications, Okoroanyanwu, U. et al., Chem. Mater. Oct. 1998, 3319-3327.
Kim Seong-Ju
Park Joo-Hyeon
Park Sun-Yi
Seo Dong-Chul
Ashton Rosemary
Baxter Janet
Korea Kumho Petrochemical Co. Ltd.
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