Substrate drying apparatus

Details Substrate drying apparatus Substrate drying apparatus

1993-08-24

1994-12-06

Gromada, Denise L.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34470, 34 77, F26B 2106

Patent

active

053698916

ABSTRACT:
A substrate drying apparatus comprising a vessel in which IPA is contained, a chamber enclosing the vessel, a heating heater for heating IPA into vapor in the vessel and in that region in the vessel where a plurality of substrates are vapor-processed, a mechanism for carrying the plural water-washed substrates into the vapor-processing region in the vessel, a mechanism located above the vapor-processing region in the vessel to cool the IPA vapor into solution drops, region in the chamber located above the cooling mechanism where the substrates can be dried while removing IPA from the substrates, and gas supply and exhaust devices for causing gas to flow from above to below in the drying region in the chamber.

REFERENCES:
patent: 4079522 (1978-03-01), Ham
patent: 4628616 (1986-12-01), Shirai et al.
patent: 4776105 (1988-10-01), Mishina et al.
patent: 4841645 (1989-06-01), Bettcher et al.
patent: 5038496 (1991-08-01), Mishina et al.

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