Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1994-11-23
1999-10-19
Saadat, Mahshid
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257379, 257408, 257409, 257536, H01L 2976, H01L 2994, H01L 31062, H01L 31113, H01L 31119
Patent
active
059693924
ABSTRACT:
A high voltage MOS transistor, for use in a thermal ink jet printhead, is fabricated with a single, uniformly thick layer of polysilicon that serves as a field plate over the drift region and a gate over the channel region. The fabrication of the drift region and associated drift oxide is performed in a sequence independent of the device channel stop and field oxide fabrication, allowing the drift region to be optimized by varying the thickness of the drift oxide. Using a field plate to increase the breakdown voltage of the device by reducing the concentration of the electric field, the device transconductance is increased by increasing the doping of the drift region without an attendant decrease in breakdown voltage.
REFERENCES:
patent: 4599576 (1986-07-01), Yoshida
patent: 4947192 (1990-08-01), Hawkins et al.
patent: 5010355 (1991-04-01), Hawkins et al.
patent: 5075250 (1991-12-01), Hawkins et al.
patent: 5089871 (1992-02-01), Fujihara
"Integrated High-Voltage/Low-Voltage MOS Devices"; IEDM; 1981; p. 259.
"850V NMOS Driver with Active Outputs"; IEDM; 1984; p. 266.
Burke Cathie J.
Hawkins William G.
Henry II William A.
Saadat Mahshid
Wilson Allan R.
Xerox Corporation
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